Senior Scanner Metrology Engineer

Job Description

Job Description

Job Description

Micron’s Boise site is a cornerstone of the company’s historic investment in leading-edge semiconductor manufacturing. The Boise expansion team is building advanced DRAM capabilities that will enable future technology innovation and long-term growth, supported by strong collaboration across process, equipment, and integration engineering organizations.

The Senior Photolithography Scanner Metrology Engineer develops, implements, and optimizes advanced metrology solutions to enable world-class lithography performance. This role focuses on overlay measurement, alignment accuracy, and scanner–metrology interaction to ensure precise pattern placement critical to advanced DRAM manufacturing.

Responsibilities:

• Develop, optimize, and sustain scanner metrology solutions supporting advanced photolithography processes.
• Drive improvements in overlay performance, alignment accuracy, and process control using data-driven analysis.
• Utilize KLA metrology systems and diffraction-based overlay techniques to monitor and improve lithography performance.
• Partner with process, equipment, and integration teams to troubleshoot and resolve overlay and alignment issues.
• Perform root cause analysis on overlay errors, tool matching challenges, and process variability while improving SPC metrics.

Minimum Qualifications:

• 5+ years of semiconductor industry experience focused on scanner metrology, overlay, or lithography metrology systems.
• Hands-on experience with KLA metrology tools and overlay measurement techniques, including diffraction-based overlay.
• Strong understanding of alignment and overlay fundamentals in advanced photolithography.
• Experience troubleshooting overlay or metrology issues in a fab or manufacturing environment.
• Bachelor’s or Master’s degree in Engineering or a related technical field, equivalent military experience, or an AAS with 5+ years of relevant experience.
• Willingness to travel internationally for onboarding and training.

Preferred Qualifications:

• Deep knowledge of lithography–metrology interaction, including scanner alignment, overlay budgets, and process-induced variability.
• Experience working in high-volume manufacturing environments.
• Strong analytical and problem-solving skills with a meticulous, data-driven approach.
• Familiarity with advanced metrology techniques such as optical overlay, scatterometry, or CD metrology.
• Experience with SPC, fault detection, data analytics tools, or programming and data science platforms such as Python, JMP, or MATLAB.