Overlay Metrology Engineer

Introduction At IBM Research, we are the innovation engine of IBM. Exploring what’s next in computing and shaping the technologies the world will rely on tomorrow. From advancing AI and hybrid cloud to pioneering practical quantum computing, we anticipate challenges and unlock new opportunities for clients, partners, and society. Working in Research means joining a team that accelerates discovery at the intersection of high-performance computing, AI, quantum, and cloud. You’ll collaborate with leading scientists, engineers, and visionaries to push boundaries and turn ideas into reality. With a culture built on curiosity, creativity, and collaboration, IBM Research offers the opportunity to grow your career while contributing to breakthroughs that transform industries and change the world. Your Role And Responsibilities Monitor and analyze overlay KPIs through daily performance readouts and weekly reports, identifying trends, root causes, and improvement opportunities. Provide real‑time line support for overlay metrology operations, addressing spec violations, measurement failures, tool behavior issues, and recipe‑related constraints. Drive continuous improvement of overlay measurement robustness, precision, and stability across Image‑Based, SEM‑Based, and Diffraction‑Based overlay methodologies. Design, develop, and optimize overlay marks and KERF structures, ensuring compatibility with advanced device architectures and enabling high‑quality measurements across multiple metrology platforms. Create, refine, and maintain overlay measurement recipes, partnering closely with technicians to support complex or novel process layers. Collaborate with process owners, device integration, and lithography teams to ensure metrology solutions meet technology roadmap requirements for next‑generation nodes. Evaluate and qualify new tool capabilities through direct interactions with equipment vendors, defining areas of collaboration and driving joint improvement projects. Perform detailed data analysis and communicate technical findings clearly to cross‑functional engineering teams through presentations and written reports. Contribute to the development of automation, infrastructure upgrades, and workflow improvements that enhance overlay control and operational efficiency. Preferred Education Doctorate Degree Required Technical And Professional Expertise Hands‑on experience with KLA overlay metrology tools (2+ years) Background in the microelectronics or semiconductor industry (4+ years) Working knowledge of overlay infrastructure and associated software platforms (2+ years) Experience in overlay mark design and KERF development for Image‑Based, SEM‑Based, or Diffraction‑Based overlay targets Bachelor’s degree in a science or engineering discipline Proficiency in data analysis, including preparing and presenting technical findings (2+ years) Preferred Technical And Professional Experience Advanced experience with KLA overlay tools (4+ years) Familiarity with run‑to‑run control or line control software (1+ year) Extensive microelectronics/semiconductor industry experience (6+ years) Expert‑level knowledge of overlay infrastructure and software suites (4+ years) Examples: 5DA, Ovalis, KT‑Analyzer, Metrology Target Designer (MTD) Master’s or PhD in a science or engineering field #J-18808-Ljbffr IBM