Principal EUV Mask BEOL R&D Engineer

Overview Our vision is to transform how the world uses information to enrich life for all. Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever. Micron’s Mask Technology Center (MTC) team is at the forefront of High‑NA EUV innovation . We work on the industry’s toughest lithography and mask challenges and collaborate across fields to define what next‑generation DRAM manufacturing will look like. We take on complex physics, new materials, and advanced inspection technologies—and we have fun doing it! In this role, you will lead development of EUV mask BEOL technologies that enable Micron’s future roadmap. You’ll own high‑visibility R&D programs, partner closely with suppliers, guide technology choices, and drive readiness for High‑NA EUV manufacturing. This is a hands‑on, high‑impact role for someone who enjoys deep technical exploration, modeling, and mentoring others while shaping long‑term strategy. Responsibilities Lead R&D for EUV mask BEOL characterization, quality enablement, defect printability rules, and imaging performance. Develop actinic inspection, automated defect classification, printability assessment, metrology, and defect repair processes. Drive physics‑based modeling and lithography simulation to correlate mask properties with wafer performance. Define tool capability requirements, lead early supplier engagement, and guide technology selection. Mentor engineers and transition developed technologies to BEOL process engineering teams. Minimum Qualifications MS or PhD in Physics, Optics, Materials Science, or related field. Experience in EUV or High‑NA EUV mask or wafer technology development. Strong understanding of EUV lithography and mask‑to‑wafer correlation. Hands‑on experience with lithography simulation and mask pattern design. Proven ability to lead sophisticated R&D programs and communicate across teams and suppliers. Preferred Qualifications Experience in actinic mask inspection, defect printability, or mask repair. Background in BEOL mask process quality control or production qualification. Experience defining advanced semiconductor tool requirements and roadmap strategy. Familiarity with supplier engagement and early‑phase tool development. Equal Opportunity Employment Micron is proud to be an equal opportunity workplace and is an affirmative action employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, age, national origin, citizenship status, disability, protected veteran status, gender identity or any other factor protected by applicable federal, state, or local laws. #J-18808-Ljbffr 1000 Micron Technology, Inc.